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Layer-by-layer Pattern Propagtion and Pulsed Laser Deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Brendel, Lothar Wolf, Dietrich E. |
| Copyright Year | 2001 |
| Abstract | In this article kinetic Monte Carlo simulations for molecular beam epitaxy (MBE) and pulsed laser depositon (PLD) are compared. It will be shown that an optimal pattern conservation during MBE is achieved for a specific ratio of diffusion to deposition rate. Further on pulsed laser deposition is presented as an alternative way to control layer by layer growth. First results concerning the island density in the submonolayer regime are shown. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://arxiv.org/pdf/cond-mat/0104227v1.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Chemical vapor deposition Fiber laser Kinetic Monte Carlo Kinetics Molecular beam epitaxy Monte Carlo method Physical vapor deposition Programmable logic device Pulsed laser deposition Simulation |
| Content Type | Text |
| Resource Type | Article |
