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Surface roughening in low-pressure chemical vapor deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Drotar, Jason T. Zhao, Y.-P. Lu, T.-M. Wang, G.-C. |
| Copyright Year | 2001 |
| Abstract | We examine, using (211)-dimensional Monte Carlo simulations, the roughening behavior of a reemission model for chemical vapor deposition. We find that, for pure first-order reemission, the interface roughens logarithmically with time and that the scaling exponents are, for most sets of conditions, close to the exponents of the Edwards-Wilkinson model (a50, b50, and z52). We compare our results to experimental results on chemical vapor deposition. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://homepages.rpi.edu/~wangg/publications/PRB25411.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Chemical vapor deposition Clusia minor First-order predicate Image scaling Monte Carlo method Simulation Test scaling Vacuum deposition |
| Content Type | Text |
| Resource Type | Article |
