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Ion Implantation Process Background of the Invention
| Content Provider | Semantic Scholar |
|---|---|
| Author | Waxler, Aaron |
| Copyright Year | 2017 |
| Abstract | An ion implantation process comprises performing mass Separation of ions from an ionised Source of phosphorus So as to select the Pions and reject phosphorus hydride ion Species. The P ions are injected into a Semiconductor Substrate. The rejection of phosphorus hydride ions Species is facilitated because there are no Such species adjacent (in terms of effective mass) the Pion species. The use of the P. ion Species also improves the implantation process for shallow implantation depths. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/06/ab/54/80757eba283089/US6184536.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |
