Loading...
Please wait, while we are loading the content...
Similar Documents
Modeling of the gas-phase chemistry in C–H–O gas mixtures for diamond chemical vapor deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Petherbridge, James R. May, Paul Wesley Ashfold, Michael N. R. |
| Copyright Year | 2001 |
| Abstract | The boundaries of the diamond deposition region in the C–H–O (Bachmann) atomic phase composition diagram have been reproduced successfully for 38 different C, H, and O containing gas mixtures using the CHEMKIN computer package, together with just two criteria—a minimum mole fraction of methyl radicals [CH3] and a limiting value of the [H]/[C2H2] ratio. The diamond growth/no-growth boundary coincides with the line along which the input mole fractions of C and O are equal. For every gas mixture studied, no-growth regions are found to coincide with a negligible (<10−10) mole fraction of CH3 radicals, while for gas mixtures lying within the diamond growth region the CH3 mole fraction is ∼10−7. Each no-growth→diamond growth boundary is seen to be accompanied by a 2–3 order of magnitude step in CH3 mole fraction. The boundary between diamond and nondiamond growth is less clearly defined, but can be reproduced by assuming a critical, temperature dependent [H]/[C2H2] ratio (0.2, in the case that Tgas=2000 K) that... |
| Starting Page | 5219 |
| Ending Page | 5223 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.1360221 |
| Alternate Webpage(s) | http://www.chemistry.bristol.ac.uk/pt/diamond/pdf/jap89-5219.pdf |
| Alternate Webpage(s) | https://doi.org/10.1063/1.1360221 |
| Volume Number | 89 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
