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Structural and Electrical Properties of Oriented Ferroelectric CaBi2Nb2O9 Thin Films Deposited on n+-Si(100) by Pulsed Laser Deposition
| Content Provider | Scilit |
|---|---|
| Author | Cho, H. S. Desu, S. B. |
| Copyright Year | 1997 |
| Description | Journal: Physica Status Solidi (a) |
| Ending Page | 378 |
| Starting Page | 371 |
| ISSN | 2573508X |
| e-ISSN | 1521396X |
| DOI | 10.1002/1521-396x%28199706%29161%3A2%3C371%3A%3Aaid-pssa371%3E3.0.co%3B2-x |
| Journal | Physica Status Solidi (a) |
| Issue Number | 2 |
| Volume Number | 161 |
| Language | English |
| Publisher | Wiley-Blackwell |
| Publisher Date | 1997-06-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Physica Status Solidi (a) Pulsed Laser Deposition Electric Field Thin Film Dielectric Constant Thin Film Deposition Leakage Current |
| Content Type | Text |
| Resource Type | Article |