NDLI: Main‐chain photosensitive polyamic acids using alkaline aqueous solution as developer

Content Provider	Scilit
Author	Hou, Haoqing Yang, Zhenghua Ding, Mengxian
Copyright Year	1999
Description	Journal: Polymer International
Related Links	http://onlinelibrary.wiley.com/doi/10.1002/(SICI)1097-0126(199905)48:5<421::AID-PI153>3.0.CO;2-5/pdf
Ending Page	425
Page Count	5
Starting Page	421
ISSN	09598103
e-ISSN	10970126
DOI	10.1002/%28sici%291097-0126%28199905%2948%3A5%3C421%3A%3Aaid-pi153%3E3.0.co%3B2-5
Journal	Polymer International
Issue Number	5
Volume Number	48
Language	English
Publisher	Wiley-Blackwell
Publisher Date	1999-05-01
Access Restriction	Open
Subject Keyword	Journal: Polymer International Photosensitive Polyimide Alkaline Aqueous Solution
Content Type	Text
Resource Type	Article
Subject	Organic Chemistry Materials Chemistry Polymers and Plastics

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Main‐chain photosensitive polyamic acids using alkaline aqueous solution as developer