NDLI: A positive‐working photosensitive alkaline‐developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

Content Provider	Scilit
Author	Seino, H. Mochizuki, A. Haba, O. Ueda, M.
Copyright Year	1998
Description	Journal: Journal of Polymer Science Part A: Polymer Chemistry
Related Links	https://onlinelibrary.wiley.com/doi/pdf/10.1002/(SICI)1099-0518(199812)36:17<3197::AID-POLA23>3.0.CO;2-3
Ending Page	3197
Page Count	1
Starting Page	3197
ISSN	0887624X
e-ISSN	10990518
DOI	10.1002/%28sici%291099-0518%28199812%2936%3A17%3C3197%3A%3Aaid-pola23%3E3.3.co%3B2-v
Journal	Journal of Polymer Science Part A: Polymer Chemistry
Issue Number	17
Volume Number	36
Language	English
Publisher	Wiley-Blackwell
Publisher Date	1998-12-01
Access Restriction	Open
Subject Keyword	Journal: Journal of Polymer Science Part A: Polymer Chemistry
Content Type	Text
Subject	Organic Chemistry Materials Chemistry Polymers and Plastics

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A positive‐working photosensitive alkaline‐developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound