NDLI: Capillary Force Lithography: Large-Area Patterning, Self-Organization, and Anisotropic Dewetting

Content Provider	Scilit
Author	Suh, K. Y. Lee, H. H.
Copyright Year	2002
Description	Journal: Advanced Functional Materials
Ending Page	413
Starting Page	405
ISSN	2573508X
e-ISSN	16163028
DOI	://10.1002:6/1616-3028%2820020618%2912%3A6/7%3C405%3A%3Aaid-adfm405%3E3.0.co%3B2-1
Journal	Advanced Functional Materials
Issue Number	6-7
Volume Number	12
Language	English
Publisher	Wiley-Blackwell
Publisher Date	2002-06-18
Access Restriction	Open
Subject Keyword	Journal: Advanced Functional Materials Manufacturing Engineering Anisotropic Dewetting Lithography Capillary Force Patterning 3d Poly(dimethylsiloxanes) (pdms)
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Biomaterials Electronic, Optical and Magnetic Materials Condensed Matter Physics Electrochemistry

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Capillary Force Lithography: Large-Area Patterning, Self-Organization, and Anisotropic Dewetting