Loading...
Please wait, while we are loading the content...
Similar Documents
Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous $Al_{2}O_{3}$Thin Films
| Content Provider | Scilit |
|---|---|
| Author | Xiong, Yuqing Sang, Lijun Chen, Qiang Yang, Lizhen Wang, Zhengduo Liu, Zhongwei |
| Copyright Year | 2013 |
| Description | Journal: Plasma Science and Technology Without extra heating, $Al_{2}O_{3}$ thin films were deposited on a hydrogen-terminated Si substrate etched in hydrofluoric acid by using a self-built electron cyclotron resonance (ECR) plasma-assisted atomic layer deposition (ALD) device with $Al(CH_{3})_{3}$ (trimethylaluminum; TMA) and $O_{2}$ used as precursor and oxidant, respectively. During the deposition process, Ar was introduced as a carrier and purging gas. The chemical composition and microstructure of the as-deposited $Al_{2}O_{3}$ films were characterized by using X-ray diffraction (XRD), an X-ray photoelectric spectroscope (XPS), a scanning electron microscope (SEM), an atomic force microscope (AFM) and a high-resolution transmission electron microscope (HRTEM). It achieved a growth rate of 0.24 nm/cycle, which is much higher than that deposited by thermal ALD. It was found that the smooth surface thin film was amorphous alumina, and an interfacial layer formed with a thickness of ca. 2 nm was observed between the $Al_{2}O_{3}$ film and substrate Si by HRTEM. We conclude that ECR plasma-assisted ALD can grow $Al_{2}O_{3}$ films with an excellent quality at a high growth rate at ambient temperature. |
| Related Links | http://iopscience.iop.org/article/10.1088/1009-0630/15/1/09/pdf |
| Ending Page | 55 |
| Page Count | 4 |
| Starting Page | 52 |
| ISSN | 10090630 |
| e-ISSN | 20586272 |
| DOI | 10.1088/1009-0630/15/1/09 |
| Journal | Plasma Science and Technology |
| Issue Number | 1 |
| Volume Number | 15 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2013-01-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Plasma Science and Technology Coatings and Films Thin Film Substrate Si |
| Content Type | Text |
| Resource Type | Article |
| Subject | Condensed Matter Physics |