NDLI: Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge

Content Provider	IEEE Xplore Digital Library
Author	Yukimura, K. Ehiasarian, A.P. Ogiso, H. Nakano, S. Azuma, K.
Copyright Year	1973
Abstract	Droplet-free metal plasma sources are a promising technology for enhancing the adhesion of deposited films to a smooth surface. High-power pulsed sputtering (HPPS) plasma is an arc-free glow discharge plasma with an instantaneous power consumption of several tens of kilowatts, although the average power consumed is the same as that in conventional sputtering discharge systems. Sputtered metallic species are significantly ionized. The fractions of singly and doubly charged ions of argon and titanium in an HPPS plasma are studied using a time-averaged ion energy distribution function in the power-density region from 0.5 to 2.5 kW/cm². Facile production of metallic ions is confirmed. Singly charged ions are dominant in the plasma. Argon and titanium ions together constitute more than 90% of the charged particles in the plasma. The metal ions are produced with increasing plasma power consumption. The instantaneous power contributes to the ionization of the plasma species. The gas ion energies is in a narrow range of a few electronvolts. Conversely, metallic ions is in a wider range of energy up to approximately 10 eV. It is seen from an optical emission spectrum of the HPPS plasma that metallic species are highly ionized.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	3125
Ending Page	3132
Page Count	8
File Size	529153
File Format	PDF
ISSN	00933813
Volume Number	39
Issue Number	11
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-11-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Ions Metals Argon Sputtering Discharges Plasma sources high-power pulsed sputtering (HPPS) Glow discharge high-power impulse magnetron sputtering (HIPIMS)
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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High-Power Inductively Coupled Impulse Sputtering Glow Plasma

Electrical and Optical Characteristics of High-Power Pulsed Sputtering Glow Discharge

High-Power Pulsed Magnetron Sputtering Glow Plasma in Argon Gas and Pulsed Ion Extraction

A New Approach to High-Power Pulsed Glow Plasma Generation: Shunting Glow Plasma

Spatial Distribution of a High-Power Impulse Magnetron Sputtering Glow Plasma by a Controlled Unbalanced Magnetic Field

Carbon Ion Production Using a High-Power Impulse Magnetron Sputtering Glow Plasma

Dynamics of HiPIMS Discharge Operated in Oxygen

Origin of the Delayed Current Onset in High-Power Impulse Magnetron Sputtering

Plasma Parameters in a Pre-Ionized HiPIMS Discharge Operating at Low Pressure

Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge

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