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Formation of dielectric silicon compounds by reactive magnetron sputtering
| Content Provider | Scilit |
|---|---|
| Author | Veselov, D. S. Voronov, Yu A. |
| Copyright Year | 2016 |
| Description | Journal: Journal of Physics: Conference Series The paper is devoted to the study of reactive magnetron sputtering of the silicon target in the ambient of inert argon gas with reactive gas, nitrogen or oxygen. The magnetron was powered by two mid-frequency generators of a rectangular pulse of opposite polarity. The negative polarity pulse provides the sputtering of the target. The positive polarity pulse provides removal of accumulated charge from the surface of the target. This method does not require any special devices of resistances matching and provides continuous sputtering of the target. |
| Related Links | http://iopscience.iop.org/article/10.1088/1742-6596/747/1/012022/pdf |
| ISSN | 17426588 |
| e-ISSN | 17426596 |
| DOI | 10.1088/1742-6596/747/1/012022 |
| Journal | Journal of Physics: Conference Series |
| Volume Number | 747 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2016-09-21 |
| Access Restriction | Open |
| Subject Keyword | Journal: Journal of Physics: Conference Series Coatings and Films Charge From the Surface Accumulated Charge Magnetron Sputtering Reactive Magnetron Silicon Compounds Dielectric Silicon |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy |
