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Proximity correction simulations in ultra-high resolution x-ray lithography
| Content Provider | Scilit |
|---|---|
| Author | Bourdillon, A. J. Boothroyd, C. B. |
| Copyright Year | 2001 |
| Description | Journal: Journal of Physics D: Applied Physics This paper follows previous demonstrations of demagnification by bias in ultra-high resolution proximity x-ray lithography. The demagnification, ×1-×6, is achieved without lenses or mirrors. Two-dimensional proximity corrections, applied to rectangular mask shapes, are simulated. A V-shaped inrigger, cut into the mask, is particularly effective. When a typical range of broadband illumination wavelengths is used, several beneficial effects are observed when the gap is held at the `critical condition'. Maintaining fine resolution, oscillations - due to Fresnel diffraction parallel to the longer dimension of a rectangle - are virtually eliminated, and the image intensity is made uniform by the elimination of bright spots near the ends of a rectangle. |
| Related Links | http://pdfs.semanticscholar.org/7cdf/dec62d575082722672f0b9a392b810a708ae.pdf http://iopscience.iop.org/article/10.1088/0022-3727/34/22/301/pdf |
| Ending Page | 3213 |
| Page Count | 5 |
| Starting Page | 3209 |
| ISSN | 00223727 |
| e-ISSN | 13616463 |
| DOI | 10.1088/0022-3727/34/22/301 |
| Journal | Journal of Physics D: Applied Physics |
| Issue Number | 22 |
| Volume Number | 34 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2001-11-06 |
| Access Restriction | Open |
| Subject Keyword | Journal: Journal of Physics D: Applied Physics Proximity Corrections Ultra High Resolution X Ray Lithography |
| Content Type | Text |
| Resource Type | Article |
| Subject | Surfaces, Coatings and Films Acoustics and Ultrasonics Condensed Matter Physics Electronic, Optical and Magnetic Materials |
