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High-resolution small-angle x-ray diffraction studies of evaporated silicon and germanium layers
| Content Provider | Scilit |
|---|---|
| Author | Bloch, R. Brugemann, L. |
| Copyright Year | 1989 |
| Description | Journal: Journal of Physics D: Applied Physics Measurements on evaporated single layers and multilayers of silicon and germanium were carried out using a triple-crystal x-ray diffractometer with perfect Si(111) crystals as a monochromator and analyser. The very high resolution of the triple-crystal diffractometer allows a precise determination of the structural and optical parameters of the layers. The parameters were obtained by fitting a modified Parratt model to the experimental data. |
| Related Links | http://iopscience.iop.org/article/10.1088/0022-3727/22/8/018/pdf |
| Ending Page | 1142 |
| Page Count | 7 |
| Starting Page | 1136 |
| ISSN | 00223727 |
| e-ISSN | 13616463 |
| DOI | 10.1088/0022-3727/22/8/018 |
| Journal | Journal of Physics D: Applied Physics |
| Issue Number | 8 |
| Volume Number | 22 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1989-08-14 |
| Access Restriction | Open |
| Subject Keyword | Journal: Journal of Physics D: Applied Physics Characterization and Testing of Materials X Ray Diffraction X Ray Diffractometer |
| Content Type | Text |
| Resource Type | Article |
| Subject | Surfaces, Coatings and Films Acoustics and Ultrasonics Condensed Matter Physics Electronic, Optical and Magnetic Materials |
