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| Content Provider | Royal Society of Chemistry (RSC) |
|---|---|
| Author | Stafford, Christopher M. Cabral, João T. Chiche, Arnaud |
| Copyright Year | 2008 |
| Abstract | We report a simple methodology to fabricate complex sub-micrometre periodic structures in poly(dimethylsiloxane) over large surface areas (several cm2). Single-frequency, uni- and multi-axial sinusoidal surface modulations, with tunable amplitude and wavelength, in the nano- to micrometre range, are readily demonstrated. The technique builds upon a buckling instability of a stiff layer supported by an elastomeric membrane (reported earlier), induced by surface oxidation of a pre-stretched elastomer coupon followed by removal of the applied mechanical strain. Plasma oxidation yields model surfaces with single wavelengths, sub-micrometre periodicity, achieving a dynamic range from sub-200 nm to 10s of µm, which UV ozonolysis extends to 100s of µm. We find that a single ‘dose’ parameter (exposure time × power) characterizes the surface conversion. The strain control provides unprecedented tunability of surface pattern amplitude and morphology, ranging from lines to complex periodic topologies induced under multi-axial deformation. We introduce a novel multiple strain–exposure and replication approach that extends surface topologies beyond lines, chevron and spinodal patterns (isotropic structures with a dominant wavelength). The resulting structures exhibit a glass-like surface, which is easily grafted with self-assembled monolayers to enhance functionality. Applications of this inexpensive and fast methodology include stamps for soft lithography, micromolding, templating and surface patterning. |
| Starting Page | 2360 |
| Ending Page | 2364 |
| Page Count | 5 |
| File Format | HTM / HTML PDF |
| ISSN | 1744683X |
| Volume Number | 4 |
| Issue Number | 12 |
| Journal | Soft Matter |
| DOI | 10.1039/b811817e |
| Language | English |
| Publisher | Royal Society of Chemistry |
| Access Restriction | Open |
| Subject Keyword | Ozonolysis Isotropy Soft lithography Dominant wavelength Micrometre Elastomer Dynamic range The Strain The Technique Polydimethylsiloxane Wavelength |
| Content Type | Text |
| Resource Type | Article |
| Subject | Chemistry Condensed Matter Physics |
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