NDLI: Rapid, low-temperature synthesis of <i>nc</i>-Si in high-density, non-equilibrium plasmas: enabling nanocrystallinity at very low hydrogen dilution

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Nanoparticle technology: Addressing the fundamental roadblocks to protein biomarker discovery

Advances in total scattering analysis

Photoelectrocatalytic materials for environmental applications

Nonaqueous liquid-phase synthesis of nanocrystalline metal carbodiimides. A proof of concept for copper and manganese carbodiimides

Efficient microwave-assisted synthesis of LiFePO₄ mesocrystals with high cycling stability

Macroporous polymers from particle-stabilized foams

Rapid, low-temperature synthesis of nc-Si in high-density, non-equilibrium plasmas: enabling nanocrystallinity at very low hydrogen dilution

White light-emitting devices with a single emitting layer based on bisindolylmaleimide fluorophores

Indent and bulge-discogens for controlling the columnar mesophase

Fabrication of smart nanocontainers with a mesoporous core and a pH-responsive shell for controlled uptake and release

Local structure of the B₄ phase studied by second harmonic generation and X-ray diffraction measurements

Towards crystal engineering of solid-state polymerization in dibromothiophenes

Small polarons in Nb- and Ta-doped rutile and anatase TiO₂

3-Phenyl-4-acyl-5-isoxazolonate complex of Tb³⁺ doped into poly-β-hydroxybutyrate matrix as a promising light-conversion molecular device

The detection of chiral perturbations in ferroelectric liquid crystals induced by dopants with axially chiral 2,2′-spirobiindan-1,1′-dione cores

Highly-dispersed and thermally-stable NiO nanoparticles exclusively confined in SBA-15: Blockage-free nanochannels

Synthesis, structure and properties of the hexagonal perovskite, h-BaTi_1−xHo_xO_3−x/2

A magnetic-field-assisted solution-phase route to cobalt thin film composed of cobalt nanosheets

Systematic tuning of pore morphologies and pore volumes in macroporous materials by freezing

Delicate control of crystallographic facet-oriented Cu₂O nanocrystals and the correlated adsorption ability

Aminofunctionalization and sub-micrometer patterning on silicon through silane doped agarose hydrogels

Reactive inkjet printing of polyurethanes

Effect of hydrogenation on structure and superconducting properties of CaC₆

On-paper synthesis of Au nanocatalysts from Au(III) complex ions for low-temperature CO oxidation

Low-operating voltage organic field-effect transistors with high-k cross-linked cyanoethylated pullulan polymer gate dielectrics

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Rapid, low-temperature synthesis of nc-Si in high-density, non-equilibrium plasmas: enabling nanocrystallinity at very low hydrogen dilution

Content Provider	Royal Society of Chemistry (RSC)
Author	Ostrikov, Kostya (Ken) Xu, Shuyan Cheng, Qijin
Copyright Year	2009
Abstract	Nanocrystalline silicon thin films were deposited on single-crystal silicon and glass substrates simultaneously by inductively coupled plasma-assisted chemical vapor deposition from the reactive silane reactant gas diluted with hydrogen at a substrate temperature of 200 °C. The effect of hydrogen dilution ratio X (X is defined as the flow rate ratio of hydrogen to silane gas), ranging from 1 to 20, on the structural and optical properties of the deposited films, is extensively investigated by Raman spectroscopy, X-ray diffraction, Fourier transform infrared absorption spectroscopy, UV/VIS spectroscopy, and scanning electron microscopy. Our experimental results reveal that, with the increase of the hydrogen dilution ratio X, the deposition rate Rd and hydrogen content CH are reduced while the crystalline fraction Fc, mean grain size δ and optical bandgap ETauc are increased. In comparison with other plasma enhanced chemical vapor deposition methods of nanocrystalline silicon films where a very high hydrogen dilution ratio X is routinely required (e.g. X > 16), we have achieved nanocrystalline silicon films at a very low hydrogen dilution ratio of 1, featuring a high deposition rate of 1.57 nm/s, a high crystalline fraction of 67.1%, a very low hydrogen content of 4.4 at.%, an optical bandgap of 1.89 eV, and an almost vertically aligned columnar structure with a mean grain size of approximately 19 nm. We have also shown that a sufficient amount of atomic hydrogen on the growth surface essential for the formation of nanocrystalline silicon is obtained through highly-effective dissociation of silane and hydrogen molecules in the high-density inductively coupled plasmas.
Starting Page	5134
Ending Page	5140
Page Count	7
File Format	HTM / HTML PDF
ISSN	09599428
Volume Number	19
Issue Number	29
Journal	Journal of Materials Chemistry
DOI	10.1039/b904227j
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Raman Fourier Nanocrystalline silicon Chemical vapor deposition Silane Hydrogen Dilution ratio Rate ratio Raman spectroscopy X-ray crystallography Fourier transform Infrared spectroscopy Ultraviolet\u2013visible spectroscopy Scanning electron microscope Band gap Blood plasma Electronvolt Dissociative
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Chemistry

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