NDLI: Electrodeposition of thin-film rare-earth-metal oxocuprates

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Journal of Materials Chemistry Vol -5

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Electrodeposition of thin-film rare-earth-metal oxocuprates

Content Provider	Royal Society of Chemistry (RSC)
Author	Partridge, Robert D. Janes, Robert Hall, Simon B. Monk, Paul M. S.
Copyright Year	1996
Abstract	Cathodic deposition from an aqueous solution containing the simple nitrate salts of Nd3+ and Cu2+ yields insoluble thin-film oxyhydroxide layers. Variation of the electrode substrate, solute concentrations (absolute and relative, one to another), applied cathodic potential and cell geometry allows the production of films with a wide range of precursor compositions. Conditions were optimised to allow production of a solid thin film which, on firing at 940°C, yielded Nd2CuO4. Since the electrodeposited material comprises intimate mixtures of oxide, subsequent firing to yield the desired semiconductor requires a relatively low firing temperature. The compositions of the products formed are accounted for in terms of solubility constants and a reaction front between the electrogenerated material and cations in the bulk solution.
Starting Page	183
Ending Page	186
Page Count	4
File Format	PDF
ISSN	09599428
Volume Number	6
Issue Number	2
Journal	Journal of Materials Chemistry
DOI	10.1039/JM9960600183
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Nitrate Electrode Molecular geometry Electroplating Semiconductor
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Chemistry

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