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| Content Provider | IET Digital Library |
|---|---|
| Author | Zhao, Leran Zhao, Changjiang Liu, Juncheng Liu, Zhigang Chen, Yan |
| Abstract | The effects of sputtering pressure on the O/Si ratio, microstructure, surface morphology and optical properties within 300–1100 nm of SiO2 film via radio frequency magnetron sputtering were investigated. The results showed that the molar ratio of O/Si in the film increased from 1.96 to 2.03, from silicon rich to oxygen rich, with the sputtering pressure increase from 0.3 to 1.3 Pa. The SiO2 films deposited at different pressure were all amorphous. There were many ditches with a length of about 50 nm on the surface of the film deposited at lower pressure. The increase of sputtering pressure could reduce the number of ditches, and make the surface denser and more uniform. The refractive index increased first, then decreased and finally increased with the increase of sputtering pressure, and the maximum and minimum values were obtained at 0.7 and 1.1 Pa, respectively. The change of absorptivity was approximately the same as that of the refractive index, while the change of the average transmittance of coated quartz glass was exactly the opposite of refractive index. The minimum value of the average transmittance 92.6% and the maximum value 93.1% were obtained at 0.7 and 1.1 Pa, respectively. |
| Starting Page | 872 |
| Ending Page | 876 |
| Page Count | 5 |
| Volume Number | 15 |
| e-ISSN | 17500443 |
| Issue Number | Issue 12, Oct (2020) |
| Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/mnl/15/12 |
| Journal | Micro & Nano Letters |
| Publisher Date | 2020-10-21 |
| Access Restriction | Open |
| Rights Holder | © The Institution of Engineering and Technology |
| Subject Keyword | Absorptivity Average Transmittance Coated Quartz Glass Condensed Matter Deposition by Sputtering Epitaxy Film Microstructure O/Si Ratio Optical Constants And Parameter Optical Property Pressure 0.3 Pa to 1.3 Pa Radio Frequency Magnetron Sputtering Refractive Index Silicon Compound SiO2 Size 50.0 Nm Solid Surface Structure Sputter Deposition Sputtering Pressure Structure Surface Modulator/Detector Array Thin Film Thin Film Growth Ultraviolet Spectra Visible And Ultraviolet Spectra of Other Nonmetals Visible Spectra Wavelength 300.0 Nm to 1100.0 Nm |
| Content Type | Text |
| Resource Type | Article |
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