NDLI: Performance of St707 getter material in a rep-rated high power microwave sealed-tube vircator under UHV conditions

Content Provider	IEEE Xplore Digital Library
Author	Kelly, P.M. Parson, J.M. Lynn, C. Taylor, M. Dickens, J.C. Neuber, A. Mankowski, J. Calico, S. Scott, M.
Copyright Year	2014
Description	Author affiliation: Lockheed Martin Missiles & Fire Control, Grand Prairie, TX, USA (Calico, S.; Scott, M.) \|\| Dept. of Electr. & Comput. Eng., Texas Tech Univ., Lubbock, TX, USA (Kelly, P.M.; Parson, J.M.; Lynn, C.; Taylor, M.; Dickens, J.C.; Neuber, A.; Mankowski, J.)
Abstract	This study focuses on the use of St707 non-evaporable getter (NEG) material in a high power microwave (HPM) sealed-tube virtual cathode oscillator (vircator) operated at repetition rates up to 200 Hz. High-current pulsed operation releases gases trapped within the bulk materials and gas monolayers on material surfaces, leading to localized plasma production between the A-K gap. This potentially leads to gap closure, shortens the duration of microwave production, and spoils low vacuum levels. A single current pulse may increase the chamber pressure to the low $10^{-6}$ Torr range from an initial background pressure in the low $10^{-9}$ Torr range, desorbing approximately $10^{14}$ particles. For single pulse operation, it is sufficient to maintain this background pressure $(10^{-9}$ Torr) with a small ion pump rated at 20 L/s. However, at 200 Hz operation, a pumping speed of 1,000 L/s is needed to evacuate $10^{14}$ particles from the vircator volume between pulses. Rather than adding a bulky pump system with the required high pump speed, St707 getter material (70% Zr, 24.6% V, 5.4% Fe) has been used to maintain ultra-high vacuum (UHV) conditions during rep-rate operation. Characteristics of the St707 NEG pump in a repetitive, high-current pulse environment are presented. Diagnostic results obtained with an inverted magnetron cold cathode gauge for absolute pressure are utilized to analyze NEG performance in detail.
Starting Page	213
Ending Page	216
File Size	544319
Page Count	4
File Format	PDF
ISBN	9781467373234
e-ISBN	9781479940479
DOI	10.1109/IPMHVC.2014.7287246
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-06-01
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	High power microwave generation Vacuum systems Hydrogen cathodes Microwave oscillators Plasmas Gettering Argon Anodes Cathodes
Content Type	Text
Resource Type	Article

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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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