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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yatsui, Kiyoshi Jiang, Weihua Suematsu, Hisayuki Harada, Nobuhiro Imada, Go Suzuki, Tsuneo Kinemuchi, Yoshiaki Yang, Sung-Chae |
| Copyright Year | 2000 |
| Description | Author affiliation: Department of Electrical Engineering, Nagaoka University of Technology, Niigata 940-2188, Japan (Harada, Nobuhiro; Imada, Go) || Extreme Energy-Density Research Institute, Nagaoka University of Technology, Niigata 940-2188, Japan (Yatsui, Kiyoshi; Jiang, Weihua; Suematsu, Hisayuki; Suzuki, Tsuneo; Kinemuchi, Yoshiaki; Yang, Sung-Chae) |
| Abstract | Recent activities of pulsed power technology and its applications are overviewed. Using high density ablation plasma inherent to short range of ion beam in targets, we have successfully prepared crystallized thin film of B4C by ion beam evaporation, which is characterized by hardness, wear resistant, and stability at high temperature. Fullerenes have been prepared as well. Ultrafine nanosize powders have been synthesized by pulsed wire discharge. Flue gas treatment of NOx has been succeeded by intense pulsed relativistic electron beam. Foil acceleration has been observed to be ∼ 8 km/s with the ablation pressure of 13 GPa. Pulsed laser deposition was used to prepare (Cr1∼x,Alx)N films. The AlN solubility limit was found to be 77 at.% AlN. The hardness of the films increases with x up to 0.75, and decreases rapidly due to the presence of amorphous structure. Highly repetitive, new pulsed power generator has been operational, with the specifications of 400 kV, 13 kA, 120 ns, 1 pps. |
| Starting Page | 17 |
| Ending Page | 29 |
| File Size | 2357821 |
| Page Count | 13 |
| File Format | |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-06-20 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | Nagaoka University of Technology |
| Subject Keyword | X-ray scattering ion beam evaporation nanosize powders B4C film Microelectronics foil acceleration Artificial intelligence highly repetitive pulsed power generator Substrates ion beam ablation plasma flue gas treatment |
| Content Type | Text |
| Resource Type | Article |
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