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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Miyazaki, K. Takamiya, T. Tsukamoto, H. |
| Copyright Year | 2003 |
| Description | Author affiliation: Dept. of Biol. Functions & Eng., Kyushu Inst. of Technol., Kitakyushu, Japan (Miyazaki, K.; Takamiya, T.; Tsukamoto, H.) |
| Abstract | We fabricated thin film thermocouples (TFTCs) to measure temperature distributions at the micro-scale. Nickel film was deposited as the first thermocouple material. Silicon dioxide was then deposited on the Ni film as an insulator. To make the thermocouple junctions, micro-holes were opened by focused ion beam (FIB), and tungsten film was patterned on the insulator as the. second thermocouple material. The thermocouple junctions were 0.5 /spl mu/m across. We also fabricated a micro-heater near the micro-TFTCs. The heat flux from the micro-heater was estimated by measuring the applied electric power. By using this micro-heater we calibrated the micro-TFTCs without using other thermocouples. With this setup, we have measured temperature distributions with 10 /spl mu/m spatial resolution, which is finer than that of an IR-microscope. |
| Starting Page | 673 |
| Ending Page | 676 |
| File Size | 248741 |
| Page Count | 4 |
| File Format | |
| ISBN | 078038301X |
| DOI | 10.1109/ICT.2003.1287602 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2003-08-17 |
| Publisher Place | France |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Fabrication Temperature measurement Temperature distribution Nickel Insulation Transistors Silicon compounds Semiconductor films Ion beams Tungsten |
| Content Type | Text |
| Resource Type | Article |
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