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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Brain, R. Baran, A. Bisnik, N. Chen, H.-P. Choi, S.-J. Chugh, A. Fradkin, M. Glassman, T. Hamzaoglu, F. Hoggan, E. Jahan, R. Jamil, M. Jan, C.-H. Jopling, J. Kan, H. Kasim, R. Kirby, S. Lahiri, S. Lee, B.-C. Lenski, D. Limb, J. Lindert, N. Musorrafiti, M. Neulinger, J. Rockford, L. Park, J. Singh, K. Staus, C. Steigerwald, J. Turkot, B. Vandervoorn, P. Venkatesan, R. Wu, S. Yeh, J.-Y. Wang, Y. Zhang, Z. Zhang, K. |
| Copyright Year | 2013 |
| Description | Author affiliation: Logic Technol. Dev., Intel Corp., Hillsboro, OR, USA (Brain, R.; Baran, A.; Bisnik, N.; Chen, H.-P.; Choi, S.-J.; Chugh, A.; Fradkin, M.; Glassman, T.; Hamzaoglu, F.; Hoggan, E.; Jahan, R.; Jamil, M.; Jan, C.-H.; Jopling, J.; Kan, H.; Kasim, R.; Kirby, S.; Lahiri, S.; Lee, B.-C.; Lenski, D.; Limb, J.; Lindert, N.; Musorrafiti, M.; Neulinger, J.; Rockford, L.; Park, J.; Singh, K.; Staus, C.; Steigerwald, J.; Turkot, B.; Vandervoorn, P.; Venkatesan, R.; Wu, S.; Yeh, J.-Y.; Wang, Y.; Zhang, Z.; Zhang, K.) A 22 nm generation technology is described incorporating transistor and interconnects with performance suitable for the needs of both high density DRAM and high-performance logic devices. We have integrated a 0.029 $μm^{2}$ DRAM cell capable of meeting >100μs retention at 95°C. Results will be reported for a test-vehicle with best-reported array density at $17.5Mb/mm^{2}$ based on a 128Mb macro. The process technology utilizes our leading edge 22nm 3-D tri-gate transistor as described previously [1,2]. The excellent leakage and performance characteristics of tri-gate transistors have been optimized for the access transistor, while maintaining the performance needed to enable high performance circuits in the same die. A high aspect-ratio, 3-D metal-insulator-metal capacitor trench has been integrated into the ultra-low-k interlayer dielectric and Cu metallization used for interconnect stacks. The previously described 22nm logic and SoC technology has been leveraged, with a 3-D MIM capacitor included in the ultra-low-k (ULK) ILD at the same level as the Metal-2 through Metal-4 interconnects. Excellent retention capability and yield have been demonstrated. |
| Sponsorship | IEEE Electron Devices Soc. |
| File Size | 1923209 |
| File Format | |
| ISBN | 9781467355315 |
| e-ISBN | 9784863483484 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2013-06-12 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | JSAP |
| Subject Keyword | Transistors Capacitors Logic gates Integrated circuit interconnections Random access memory Performance evaluation interconnect 22nm DRAM embedded performance MIM |
| Content Type | Text |
| Resource Type | Article |
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