NDLI: High-voltage microsecond pulse generator for plasma immersion ion implantation

Content Provider	IEEE Xplore Digital Library
Author	Vizir, V.A. Zorin, V.B. Ivanov, S.V. Kovalchuk, B.M. Maksimenko, A.D. Manilov, V.I. Smorudov, G.V. Shubkin, N.G. Chervyakov, V.V.
Copyright Year	2001
Description	Author affiliation: Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia (Vizir, V.A.; Zorin, V.B.; Ivanov, S.V.; Kovalchuk, B.M.; Maksimenko, A.D.; Manilov, V.I.; Smorudov, G.V.; Shubkin, N.G.; Chervyakov, V.V.)
Abstract	The generator is intended to supply plasma immerse ion implanters. It has the following parameters: voltage pulse amplitude - (20/spl divide/60) kV, current pulse amplitude - (100/spl divide/40) A, pulse length - (5/spl divide/20) /spl mu/s, leading edge length - 1 /spl mu/s, decay length - 2 /spl mu/s, pulse frequency - up to 1000 Hz, average power - up to 10 kW. The generator is made by the scheme of a modulator with partial capacity discharge. A high-power modulator tube GMI-29A1 (40 kV, 200 A) is used as a switch. A driver is made at a JGBT transistor. A pulse from modulator is applied by the cable to the step-up pulsed transformer placed near the implanter. The transformer has a winding switch allowing controlling the output voltage from 20 to 60 kV at a distance by 6 steps. Smooth control is realized by the power supply. The modulator has the current protection of the power supply and rapid (0.5 /spl mu/s) current protection of the modulator tube. The modulator can be controlled both from the local control board and at a distance - from the computer. The generator has a load equivalent on the basis of a water resistor. The generator also can be used as an accelerating voltage power supply for charged particle beam sources.
Sponsorship	Plasma Sci. & Appl. Committee Pulsed Power Sci. & Technol. Committee of the IEEE Nucl. & Plasma Sci. Soc
Starting Page	721
Ending Page	722
File Size	189226
Page Count	2
File Format	PDF
ISBN	0780371208
DOI	10.1109/PPPS.2001.1002197
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-06-17
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Pulse generation Plasma immersion ion implantation Switches Pulse modulation Power supplies Voltage Pulse transformers Pulsed power supplies Protection Frequency
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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