NDLI: Thyratron modulators in plasma source ion implantation

Content Provider	IEEE Xplore Digital Library
Author	Adler, R.J. Scheuer, J. Horne, W.
Copyright Year	1995
Description	Author affiliation: North Star Res. Corp., USA (Adler, R.J.)
Abstract	Plasma source ion implantation (PSII) is an emerging technology which can be used to harden metal surfaces in a conformal manner. North Star Research Corp. (NSRC) is building a unique implanter system for Empire Hard Chrome which will be the first truly commercial implanter of this type. The choice of pulsed power technology for this application is important from the standpoint of both reliability and compatibility with the basic plasma processes under consideration. In this paper, the authors evaluate the various possible pulsed power system choices including thyratron modulators, hard tube modulators and crossatron modulators in the context of compatibility with the plasma and implantation process. Currents in the hundreds of amperes at 80-100 kV are clearly found to be desirable based on the requirements of the process. This leads to the logical choice of thyratron/transformer modulators at lower average powers, or crossatron modulators at higher average powers. They also discuss pulse forming network design for thyratron modulators for the universal PSII-type waveform. A thyratron modulator was selected for the Empire implanter due to the requirements for low cost and high peak current.
Starting Page	1243
Ending Page	1248
File Size	410952
Page Count	6
File Format	PDF
ISBN	0780327918
DOI	10.1109/PPC.1995.599786
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-07-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Thyratrons Plasma sources Ion implantation Pulse modulation Pulse power systems Power system reliability Plasma applications Plasma immersion ion implantation Industrial power systems Pulse transformers
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Design of a 100 kV, 200 ampere, 2 kilohertz single "Hobetron" tube modulator for industrial plasma source ion implantation applications

High-voltage microsecond pulse generator for plasma immersion ion implantation

Nitrogen plasma immersion ion implantation of metals with a 2.45 GHz microwave source

TOTEM POLL DRIVE DECKS FOR THE HIGH-VOLTAGE, PULSED-POWER MODULATOR FOR A LARGE-SCALE PLASMA SOURCE

A high-voltage pulse generator for plasma ion immersion implantation applications

Semiconductor switches based pulse power generator for plasma source ion implantation

Solid state pulsed power systems for plasma immersion ion implantation

OPTIMAL PULSE-MODULATOR DESIGN CRITERIA FOR PLASMA SOURCE ION IMPLANTERS

Generation of intense pulsed ion beams by Br magnetically insulated ion diodes

Thyratron modulators in plasma source ion implantation

Similar Documents

Design of a 100 kV, 200 ampere, 2 kilohertz single "Hobetron" tube modulator for industrial plasma source ion implantation applications

High-voltage microsecond pulse generator for plasma immersion ion implantation

Nitrogen plasma immersion ion implantation of metals with a 2.45 GHz microwave source

TOTEM POLL DRIVE DECKS FOR THE HIGH-VOLTAGE, PULSED-POWER MODULATOR FOR A LARGE-SCALE PLASMA SOURCE

A high-voltage pulse generator for plasma ion immersion implantation applications

Semiconductor switches based pulse power generator for plasma source ion implantation

Solid state pulsed power systems for plasma immersion ion implantation

OPTIMAL PULSE-MODULATOR DESIGN CRITERIA FOR PLASMA SOURCE ION IMPLANTERS

Generation of intense pulsed ion beams by Br magnetically insulated ion diodes

Thyratron modulators in plasma source ion implantation