NDLI: Monolithic, integrated high-Q inductors for RF applications

Content Provider	IEEE Xplore Digital Library
Author	Eisener, B. Buyuktas, K. Rugemer, A. Kebinger, H. Herzum, C.
Copyright Year	2003
Description	Author affiliation: Infineon Technol. AG, Munich, Germany (Eisener, B.; Buyuktas, K.; Rugemer, A.; Kebinger, H.; Herzum, C.)
Abstract	This paper presents high-Q inductors processed on 500 Ohmcm silicon substrates using a mature three layer copper metallization. The fabricated inductors have been characterized with a wide banded Q maximum roughly centered at 2GHz. The maximum Q values range from Q/sub max/ = 14 for a 20nH inductor up to Q/sub max/ = 40 for a 0.5nH inductor. By means of a 1.5nH inductor the influence of metal line width and different metallization stacks on the Q value vs. frequency behavior is presented. One typical application for these inductors are integrated passive bandpass filters for mobile phone applications. We present an ESD stable H3-bandpass-filter for PCN/PCS-applications with a low insertion loss of -1.45dB and high 3rd harmonic suppression of at least -40dB. The circuit simulations have shown an excellent correlation to the S-parameter measurement data which avoid time consuming 3D field simulations leading to reduced time to market.
Sponsorship	IEEE Microwave Theory & Tech. Soc. Eur. Microwave Assoc. NASA Glenn Res. Center DaimlerChrysler AG Technische Univ. Muchen
Starting Page	107
Ending Page	110
File Size	249963
Page Count	4
File Format	PDF
ISBN	0780377877
DOI	10.1109/SMIC.2003.1196681
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-04-11
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Inductors Radio frequency Metallization Circuit simulation Silicon Copper Band pass filters Mobile handsets Electrostatic discharge Personal communication networks
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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