NDLI: A novel nanosecond pulsed plasma brush for biomedical applications

Content Provider	IEEE Xplore Digital Library
Author	Lane, Jamie Malik, Muhammad Edelblute, Chelsea Heller, Loree Schoenbach, Karl Jiang, Chunqi
Copyright Year	2014
Description	Author affiliation: Frank Reidy Research Center for Bioelectrics, Old Dominion University, 4211 Monarch Way, Ste. 300, Norfolk, VA 23508, USA (Lane, Jamie; Malik, Muhammad; Edelblute, Chelsea; Heller, Loree; Schoenbach, Karl; Jiang, Chunqi)
Abstract	The potential applications of non-equilibrium plasmas in biomedical fields are accelerating research efforts to explore and understand the physical and chemical processes responsible for their effectiveness. This work introduces and characterizes a non-equilibrium plasma “brush” for biomedical applications. The plasma electrodes consist of three parallel µm-thick sheets, a center high voltage electrode and two outer ground electrodes, which are separated by dielectric plates. Helium, argon, and dry air were individually evaluated as a carrier gas and were fed into the plasma chamber at a rate of 4 SLPM. The 3.5 cm in width, 75 µm in depth, and 1.5 to 4 cm in length (dependent on carrier gas) brush-shaped plasma plumes were generated in ambient air when 25 kV, 150 ns pulses were applied to the center active electrode at a pulse repetition rate of 500 Hz. Spatiotemporal optical emission spectroscopy was employed to evaluate the electronically excited species produced in the discharge as well as the rotational, vibrational, and electronic temperatures of the active species. Application of the cold plasma brush for surface decontamination was tested in a pilot study of plasma inactivation of two common nosocomial pathogens, Staphylococcus aureus and Acinetobacter baumaunnii.
Starting Page	1
Ending Page	1
File Size	1072124
Page Count	1
File Format	PDF
ISBN	9781479927111
e-ISBN	9781479927135
DOI	10.1109/PLASMA.2014.7012688
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-05-25
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasmas Electrodes Brushes Educational institutions Electric potential Acceleration Chemical processes
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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