NDLI: Stacked insulator induction accelerator gaps

Content Provider	IEEE Xplore Digital Library
Author	Houck, T.L. Westenskow, G.A. Kim, J.-S. Eylon, S. Henestroza, E. Yu, S.S. Vanecek, D.
Copyright Year	1997
Description	Author affiliation: Lawrence Livermore Nat. Lab., CA, USA (Houck, T.L.)
Abstract	Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The RF properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is transported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented.
Starting Page	3722
Ending Page	3724
File Size	476511
Page Count	3
File Format	PDF
ISBN	078034376X
DOI	10.1109/PAC.1997.753397
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-05-16
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Particle beams Particle accelerators Dielectrics and electrical insulation Acceleration Laboratories Stress Surface impedance Klystrons Cutoff frequency Laser beams
Content Type	Text
Resource Type	Article

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