NDLI: A simple process to fabricate self-aligned, high-performance torsional microscanners; demonstrated use in a two-dimensional scanner

Content Provider	IEEE Xplore Digital Library
Author	Choo, H. Garmire, D. Demmel, J. Muller, R.S.
Copyright Year	2005
Description	Author affiliation: Berkeley Sensor & Actuator Center, California Univ., Berkeley, CA (Choo, H.; Garmire, D.; Demmel, J.; Muller, R.S.)
Abstract	CMOS-compatible process carried out on SOI wafers, we have built high-performance torsional microscanners having vertically offset interdigitated-comb actuators. Our microscanner-fabrication process requires three photolithography masks: two to form the front-side microscanner structures and a third to define the backside openings. Both moving and fixed combs are fabricated in the same device layer (30 mum in thickness), and the offset combs are created by reducing the thickness of the fixed combs, but not that of the moving combs. Our process begins by removing the 1-mum thick thermal oxide selectively to open rectangular windows at locations where the fixed combs are to be defined. In the following step, both fixed- and moving-comb sets are defined simultaneously with a single photolithography mask; this is followed by deep-reactive ion etching (DRIE). We then perform a tuned-etch in the DRIE-etcher to obtain the desired vertical thickness for the fixed combs without affecting the moving combs. The minimum gap between comb fingers can be as small as twice the alignment accuracy of the photolithography process, which is les0.4 mum for state-of-the-art photolithography steppers. We consider these microscanners as especially well adapted for applications to refractive laser surgery of ocular corneas where small spot size and high scan speeds are important assets
Starting Page	21
Ending Page	22
File Size	643278
Page Count	2
File Format	PDF
ISBN	0780392787
DOI	10.1109/OMEMS.2005.1540056
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-08-01
Publisher Place	Finland
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Lithography Optical refraction Optical sensors Laser surgery Optical pulses Charge coupled devices Actuators Optical device fabrication Resonant frequency Biomedical optical imaging
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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