NDLI: Studies on the mechanism of high resolution and high aspect ratio in DFVP

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Studies on the mechanism of high resolution and high aspect ratio in DFVP

Content Provider	IEEE Xplore Digital Library
Author	Tingting Wen Bin Zhang Peiqing Wang
Copyright Year	2003
Description	Author affiliation: Tsinghua Univ., Beijing, China (Tingting Wen)
Abstract	Summary form only given. Development-free vapor photolithography (DFVP) is a unique all-dry pattern transfer technique with many advantages such as superior quality, high aspect ratio and high resolution. This paper analyzes the mechanism of the DFVP and proposes a theory model to explain the cause of its advantages. In this paper we study the effects of several polymers upon the development free vapor photolithography. Research shows that functional groups of polymers, glass transition temperature (Tg), film thickness, and etching temperature all have effects on the reaction. Experiments are designed and carried out, the result shows the polymer is the main factor affecting the resolution and aspect ratio of the pattern.
Sponsorship	Japan Soc. of Appl. Phys
File Size	30097
File Format	PDF
ISBN	4891140402
DOI	10.1109/IMNC.2003.1268750
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-10-29
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Japan Soc. of Applied
Subject Keyword	Lithography Polymer films Temperature Cities and towns Glass Etching
Content Type	Text
Resource Type	Article

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