NDLI: Towards a metric management approach for multi-emerging technology based fabrication facilities

Content Provider	IEEE Xplore Digital Library
Author	Tierney, R. Walsh, S.T.
Copyright Year	2009
Description	Author affiliation: University of New Mexico, Anderson School of Business, USA (Tierney, R.; Walsh, S.T.)
Abstract	Multi Technology, High Product Mix, Low Volume fabrication facilities (MT-HMLV) are the harbingers of next generation economies. Yet MT-HMLV's are fraught with ineffective operation and strategic management practice. Practices they often borrow from the metric management approach endemic of single technology high volume production facilities. If this is true in a time of recession and increased globalization then these facilities are at risk. We focus on one very important group of these facilities; those which are working at the interface of micro technology, nanotechnology and semiconductor micro fabrication. This group is not atypical. Due to the high degree of success that the metrics management approach has enjoyed in High Volume Semiconductor Fabrication facilities (HVSF) they are the “Defacto” standard for any fabrication facility remotely akin to semiconductor fabrication and this group is. However, simply applying HVSF based metrics to our group of MT-HMLV facilities are proving ineffectual. We employ an extensive literature review and the case study methods to ascertain why these commonly used metrics have been so ineffectual. Further, we utilize these same techniques to develop a more useful metrics management approach for our specific group of MT-HMLV's facilities. We base our metrics on the unique nature of MT-HMLV facilities as well as traditionally used HVSF metrics and R&D metrics.
Starting Page	409
Ending Page	419
File Size	181154
Page Count	11
File Format	PDF
ISBN	9781890843205
DOI	10.1109/PICMET.2009.5262198
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-08-02
Publisher Place	USA
Access Restriction	Subscribed
Subject Keyword	Technology management Fabrication Research and development Technological innovation Nanotechnology Production facilities Globalization Springs Foundries Environmental management
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
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9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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