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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Blank, D.H.A. |
| Copyright Year | 2003 |
| Description | Author affiliation: Facultly of Sci. & Technol., Twente Univ., Enschede, Netherlands (Blank, D.H.A.) |
| Abstract | Pulsed laser deposition (PLD) is attractive for research on complex oxides. The growth of oxide materials with PLD is the control of the surface morphology. For most materials it is necessary to control the thickness and roughness of the thin films down to an atomic scale. Such well-controlled growth can also be used to manufacture artificially layered structures of different materials with different properties. |
| File Size | 80654 |
| File Format | |
| ISBN | 0780377346 |
| DOI | 10.1109/CLEOE.2003.1313613 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2003-06-22 |
| Publisher Place | Germany |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Transistors Pulsed laser deposition Optical materials Optical pulses Rough surfaces Surface roughness Surface morphology Thickness control Atomic beams Atomic layer deposition |
| Content Type | Text |
| Resource Type | Article |
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