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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Nakayama, K. Okajima, S. Ohkuma, H. Kawahata, K. Tanaka, K. Tokuzawa, T. Ito, Y. |
| Copyright Year | 2004 |
| Description | Author affiliation: Coll. of Eng., Chubu Univ., Aichi, Japan (Nakayama, K.; Okajima, S.) |
| Abstract | Powerful short-wavelength far-infrared lasers (/spl lambda/=40 /spl mu/m-100 /spl mu/m) and the measurement system are developing for plasma diagnostics (NIFS) and a /spl lambda/ ray production (JASRI). In the wavelength region, the choice of optical materials is very important to construct the efficient optical system. A silicon etalon with high resistivity is one of the useful materials for windows and beam splitters. The optical constants (refractive index, absorption coefficients, transmissivity) of the silicon etalon have been measured by using 119-, 71-, 57- and 48-/spl mu/m lasers. In order to design the optical elements having any transmissivity and reflectivity with less than /spl plusmn/1% uncertainty for the wavelength region, the accuracies of five figures for the refractive index, the wavelength and the thickness are required. |
| Sponsorship | Univ. of Karlsruhe Karlsruhe Res. Center |
| Starting Page | 209 |
| Ending Page | 210 |
| File Size | 152341 |
| Page Count | 2 |
| File Format | |
| ISBN | 0780384903 |
| DOI | 10.1109/ICIMW.2004.1422028 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2004-09-27 |
| Publisher Place | Germany |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Optical refraction Optical variables control Wavelength measurement Plasma measurements Optical materials Silicon Refractive index Power lasers Plasma diagnostics Production systems |
| Content Type | Text |
| Resource Type | Article |
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