NDLI: Role of titanium doping on indium oxide thin films using spray pyrolysis techniques

Content Provider	IEEE Xplore Digital Library
Author	Manoharan, C. Jothibas, M. Dhanapandian, S. Kiruthigaa, G. Jeyakumar, S.J.
Copyright Year	2013
Description	Author affiliation: Dept. of Phys., Annamalai Univ., Annamalai Nagar, India (Manoharan, C.; Jothibas, M.; Dhanapandian, S.; Kiruthigaa, G.) \|\| Dept. of Phys., T.B.M.L. Coll., Porayar, India (Jeyakumar, S.J.)
Abstract	Indium oxide $(In_{2}O_{3})$ and titanium-doped indium oxide (ITiO) thin films were deposited onto glass substrates by the spray pyrolysis technique. The variations of the structural, optical and electrical properties with the titanium incorporation were investigated. The XRD profile of the films confirmed the cubic structure with preferred orientation along the (222) planes. The average crystalline size evaluated from the XRD profile lay in between 24.96nm and 34.47nm. The other crystallographic parameters namely, micro strain, dislocation density, and lattice constant had been estimated and reported. The average optical transmittance of the sample varied from 60% to 86% in the visible region. The optical band gap energy of the films varied from 3.68eV to 3.3eV, depending on the concentration of titanium. Topography and surface morphology of the films were performed by AFM, SEM and EDX analyses, respectively. It is observed that resistivity of the films decreases with increase of mobility for the doped film.
Starting Page	335
Ending Page	339
File Size	1299560
Page Count	5
File Format	PDF
ISBN	9781479913770
e-ISBN	9781479913794
DOI	10.1109/ICANMEET.2013.6609310
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-07-24
Publisher Place	India
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Annealing Spray pyrolysis Titanium Electrical Optical films Indium oxide Physical properties
Content Type	Text
Resource Type	Article

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