NDLI: Effect of deposition temperature on the properties of amorphous carbon thin film deposited using natural precursor by thermal CVD

Content Provider	IEEE Xplore Digital Library
Author	Dayana, K. Fadzilah, A.N. Rusop, M.
Copyright Year	2012
Description	Author affiliation: NANO-ElecTronic Centre (NET), Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia (Dayana, K.; Fadzilah, A.N.; Rusop, M.)
Abstract	Amorphous carbon (a-C) thin films were deposited on quartz substrate at different deposition temperature by thermal chemical vapor deposition (CVD) method using natural precursor ‘camphor oil’. All samples were grown in fixed conditions except the deposition temperature was varied from 400°C to 800°C. The a-C thin films were characterized by using UV-Vis spectroscopy, I-V measurement, Raman spectroscopy and Atomic Force Microscopy (AFM). The UV-Vis analysis was used to obtain the optical band gap. The optical bang gap was decreased from 1.0eV to 0.1eV with the increasing the deposition temperature. The electrical conductivity of a-C thin films increased as the deposition temperature increased. Raman results show that high deposition temperature induced more graphitization in the thin films. The $sp^{2}$ and $sp^{3}-bonded$ carbon amount in a-C structure could effect the optical band gap of the a-C thin films. These a-C thin films were found to be dependent on the deposition temperature and amount of $sp^{2}$ and $sp^{3}$ bonded carbon.
Starting Page	695
Ending Page	699
File Size	1086483
Page Count	5
File Format	PDF
ISBN	9781467313117
e-ISBN	9781467313100
DOI	10.1109/SHUSER.2012.6268905
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-06-24
Publisher Place	Malaysia
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Temperature measurement Temperature Camphor oil Photonic band gap Atom optics Photovoltaic cells Amorphous carbon Optical films Thermal chemical vapor deposition Carbon Thin film Deposition temperature
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in