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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yongqing Wang Haijun Song Na Chong Yingchang Zhou Rongxia Sun Wenjun Chen |
| Copyright Year | 2010 |
| Abstract | This paper briefly described the structure and experimental test device of micro inductively coupled plasma (micro-ICP) excitation source. Micro-ICP excitation source excited low-pressure argon and obtained plasma light source. Spectrometer detected atomic emission spectrometry (AES) spectrum of argon in scope of 690~860 nm. Experimental research on relationship between argon spectral lines intensity and radio frequency (RF) power, argon pressure of micro-ICP excitation source has been done. Experimental results show that argon spectral lines intensity enhanced markedly when RF power raised from 3 watt (W) to 10 W, the increasing trend weakened within 10~20 W, at 20~23 W achieved the maximum, above 23 W decreased and the discharge was unstable. The argon spectral lines intensity appeared two peaks, at 60 Pascal (Pa) and 230 Pa when the argon pressure increased from 10 Pa to 250 Pa, but the discharge was unstable above 160 Pa. We concluded the best working parameters scope of micro-ICP excitation source for exciting argon: RF power 10~20 W, working argon pressure 50~70 Pa after comprehensive analysis. |
| Starting Page | 549 |
| Ending Page | 551 |
| File Size | 294742 |
| Page Count | 3 |
| File Format | |
| ISBN | 9781424486830 |
| DOI | 10.1109/ICOIP.2010.207 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-11-11 |
| Publisher Place | China |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Radio frequency Charge coupled devices Argon spectral lines intensity Discharges Argon pressure RF power Fault location Micro-ICP excitation source Plasmas Argon Gratings |
| Content Type | Text |
| Resource Type | Article |
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