NDLI: Electric-field enhancement and ion-flux focusing at the multiwire cathode of a high-current plasma-filled diode

Content Provider	IEEE Xplore Digital Library
Author	Nefedtsev, E.V. Ozur, G.E.
Copyright Year	2008
Description	Author affiliation: Inst. of High-Current Electron., Russian Acad. of Sci., Tomsk (Nefedtsev, E.V.; Ozur, G.E.)
Abstract	The time evolution of an unsteady ion sheath in the presence of cylindrical protrusions at the cathode is studied numerically in a two-dimensional model. The calculations demonstrate the enhancement of the electric field and the focusing of the ion flow at the protrusion vertices. It is shown that, in the stage of the sheath formation, in addition to the electrostatic focusing of the ion flux, there is also focusing caused by the curvature of the plasma boundary around a protrusion. The results of calculations agree satisfactorily with the experimental data on the delay time of explosive emission at the multi-wire cathode of a high-current plasma-filled diode. For the case of planar cathode, the analytical formulas for maximum values of electric field strength and ion current density are obtained.
Starting Page	235
Ending Page	238
File Size	425983
Page Count	4
File Format	PDF
ISBN	9789737553829
ISSN	10932941
DOI	10.1109/DEIV.2008.4676763
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-09-15
Publisher Place	Romania
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Cathodes Diodes Plasma density Plasma immersion ion implantation Plasma sheaths Current density Poisson equations Electrostatics Plasma measurements Delay effects
Content Type	Text
Resource Type	Article
Subject	Computer Networks and Communications Software

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