NDLI: Leveraging applied materials TechEdge Prizm™ for advanced lithography process control

Content Provider	IEEE Xplore Digital Library
Author	Llanos, P. Cornell, R.
Copyright Year	2013
Description	Author affiliation: Adv. Software Services, Appl. Mater., Hopewell Junction, VA, USA (Llanos, P.; Cornell, R.)
Abstract	Presently the CDSEM metrology tool continues to be the “ruler of the fab” providing metrology at over 100 steps along the way to building a modern semiconductor product. We explore the history of data volume generated with Fab CDSEM fleets. As we quantify the size of the fleet dataset, it becomes clear why historically only a subset of the rich dataset is ever utilized. We review what the treatment of the data using modern “big data” analytics and enterprise level server hardware does to accelerate development learning, increase engineering turns per day and raise the velocity of accurate manufacturing feedback. This paper further explores ways to leverage TechEdge Prizm to extract more value out of metrology for Lithography process control. The paper will describe some of the challenges facing the changing Lithography metrology landscape and how Prizm delivers tailored analysis for these challenges. Results at a customer site demonstrate that various types of analysis of CDSEM images and data are 10 times more efficient and thorough than traditional methods.
Sponsorship	IEEE Electron Devices. Soc.
Starting Page	256
Ending Page	261
File Size	1586458
Page Count	6
File Format	PDF
ISBN	9781467350068
ISSN	10788743
e-ISBN	9781467350075
DOI	10.1109/ASMC.2013.6552814
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-05-14
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metrology Lithography Process control Big data Semiconductor device measurement Pattern recognition CDSEM Data mining
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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