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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Lin, C.T. Li, L. Webb, J.S. Lipeles, R.A. Leung, M.S. |
| Copyright Year | 1992 |
| Description | Author affiliation: Dept. of Chem., Northern Illinois Univ., DeKalb, IL, USA (Lin, C.T.; Li, L.; Webb, J.S.) |
| Abstract | The deposition by aqueous acetate solution (DAAS) technique has been developed for the preparation of 5% Fe-doped Pb(Zr/sub 0.53/Ti/sub 0.47/)O/sub 3/ (PZT) and (Pb/sub 0.93/La/sub 0.07/)(Zr/sub 0.65/Ti/sub 0.35/)/sub 0.983/O /sub 3/ (PLZT) thin films on Pt[111]/Ti/SiO/sub 2//Si substrates. PZT films, crystallized at 600 degrees C for 10 min, display good electrical properties and fatigue characteristics. Iron doping suppressed the crystallization of the films as measured by X-ray diffraction (XRD) and Fourier-transform infrared (FTIR) spectroscopy. When 5% of the zirconium and titanium were replaced by iron in the stoichiometric precursor solution, the film crystallized predominantly in the [110] orientation. When 5% excess iron was added to the precursor solution, the film crystallized in the [100] orientation. The electronic states and charge species responsible for photoconductivity were investigated by emission/excitation and photocurrent action spectroscopy. The low photoemission at 77 K and high photoconductivity at 298 K in the doped thin films, as compared with thermally iron-doped ceramics, are attributed to surface energy quenching and low trapping state density.< |
| Starting Page | 349 |
| Ending Page | 352 |
| File Size | 377786 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780304659 |
| DOI | 10.1109/ISAF.1992.300705 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1992-08-30 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Transistors Crystallization Iron Photoconductivity Zirconium Infrared spectra Spectroscopy Semiconductor thin films Sputtering Substrates |
| Content Type | Text |
| Resource Type | Article |
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