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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Il-Jae Shin Byoung-Chul Min Jin-Pyo Hong Kyung-Ho Shin |
| Copyright Year | 1965 |
| Abstract | We have investigated the effect of Ar pressure during MgO sputtering on the tunnel magnetoresistance (TMR) and resistance area (RA) product of CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs). The TMR of MTJs with a thin MgO tunnel barrier deposited at different Ar pressures (1.3, 4, 10, and 25 mTorr) shows a consistent relationship with X-ray diffraction (XRD) properties of thick MgO films deposited with the same conditions. The deposition of the MgO-barrier at 1.3 mTorr results in a low TMR ratio and a high RA product due to the disordered MgO barrier and the oxidation of the bottom electrode of the MTJ, while the deposition at 25 mTorr results in a rough MgO barrier, and thereby gives rise to a large shift of switching field of the free layer due to the orange-peel coupling. |
| Sponsorship | IEEE Magnetics Society |
| Starting Page | 2393 |
| Ending Page | 2395 |
| Page Count | 3 |
| File Size | 115318 |
| File Format | |
| ISSN | 00189464 |
| Volume Number | 45 |
| Issue Number | 6 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2009-06-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Tunneling magnetoresistance X-ray diffraction Magnetic properties Magnetic tunneling Argon Sputtering X-ray scattering Magnetic films Oxidation Electrodes tunnel magnetoresistance Magnetic tunnel junction MgO rf sputtering |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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