NDLI: Two-Dimensional Fluid Model of Pulse Sheath in Plasma Immersion Ion Implantation With Dielectric Substrates

Content Provider	IEEE Xplore Digital Library
Author	Xue-Chun Li You-Nian Wang
Copyright Year	1973
Abstract	A 2D fluid model is developed to describe the charging effects during plasma immersion ion implantation with dielectric substrates. The spatiotemporal evolution of the surface potential, the accumulated charge dose, and the ion impact angle at the surface of dielectric substrates are calculated with the model. The numerical results demonstrate that the charging effects lead to reduction of the surface potential with time, and the surface potential is nonuniform along the dielectric surface. The lowest value of surface potential is near but not at the edge of the dielectric target. Therefore, the charge accumulation on the dielectric surface is also a function of surface position. The dose nonuniformity is more severe near the edge of the dielectric target. To lengthen the width of the metal electrode that is located below the dielectric target, one can improve the nonuniformity of the accumulated charge dose on the dielectric surface.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	1489
Ending Page	1495
Page Count	7
File Size	291182
File Format	PDF
ISSN	00933813
Volume Number	35
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma immersion ion implantation Dielectric substrates Surface charging Dielectric materials Spatiotemporal phenomena Electrodes Polymers Voltage Electrons Two dimensional displays 2-D fluid model Charging effects plasma immersion ion implantation (PIII) sheath
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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