NDLI: Theoretical Study on Dose Distributions of the Ball Bearing Treated by Plasma Immersion Ion Implantation

Content Provider	IEEE Xplore Digital Library
Author	Yonghao Yu Wang, L. Yuhang Wang Xiaofeng Wang
Copyright Year	1973
Abstract	A two-dimensional (2-D) particle-in-cell (PIC) model was used to study plasma immersion ion implantation (PIII) process of the ball bearing. In the simulation, distributions of the normalized potential and the accumulated incident dose were calculated. In addition, the relationship among the minimum distance between neighboring ball bearings without sheath overlap, the implantation voltage, the plasma density, and the pulsewidth was obtained. When the voltage is -10 kV, the plasma density is 2.95times10⁸ cm^-3 and the pulsewidth is 10 mus; the minimum distance without sheath overlap is 38.0 cm. To evaluate the model, the potential in the sheath was measured using a probe. Experimental results are in agreement with the calculated values. The simulation results reveal that a large number of ions are implanted into the top part of the ball bearing, which shows bad dose uniformity. When the ball bearing is revolved during PIII treatment, the dose uniformity can be improved to 91.25% at least
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	1121
Ending Page	1126
Page Count	6
File Size	394914
File Format	PDF
ISSN	00933813
Volume Number	34
Issue Number	4
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2006-08-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Ball bearings Plasma immersion ion implantation Voltage Plasma density Space vector pulse width modulation Plasma temperature Two dimensional displays Plasma measurements Probes Shape simulation Bearings plasma sheaths
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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