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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Hylton, T.L. Ciorneiu, B. Baldwin, D.A. Escorcia, O. Son, J. McClure, M.T. Waters, G. |
| Copyright Year | 1965 |
| Abstract | This paper describes the development of a novel thin film deposition technology, which we call biased target ion beam deposition (BTIBD). BTIBD employs a low energy ion source (<30 eV) directed at a negatively biased target. Because typical ion energies are below the sputter threshold of vacuum construction materials, only those ions arriving at the target acquire sufficient energy to cause sputtering. A second low-energy ion source can be directed at the substrate to provide low energy (<15 eV) bombardment of the growing film. BTIBD is well suited to demanding applications requiring atomically engineered thin films and interfaces because it offers a large range of process pressures, control of adatom energies, and excellent uniformity and repeatability. This paper describes a multi-target, prototype (BTIBT) system, the associated ion sources, and process results on thin Cu films and spin valve structures. |
| Sponsorship | IEEE Magnetics Society |
| Starting Page | 2966 |
| Ending Page | 2971 |
| Page Count | 6 |
| File Size | 119229 |
| File Format | |
| ISSN | 00189464 |
| Volume Number | 36 |
| Issue Number | 5 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-09-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Sputtering Ion beams Ion sources Elementary particle vacuum Building materials Substrates Design engineering Power engineering and energy Pressure control Process control |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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