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Content Provider | IEEE Xplore Digital Library |
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Author | Saito, Y. Hashimoto, S. Inomata, K. |
Copyright Year | 1965 |
Abstract | The authors report that giant magnetoresistance (MR) at room temperature up to 52% for a low field change of 0.9 kOe can be attained in (Co/sub 9/Fe/Cu)/sub n/, multilayers. A set of (Co/sub x/Fe/sub 1-x//Cu)/sub n/ multilayers (x=1.0, 0.9 and 0.75) was prepared by an ion-beam sputter deposition method on MgO [110] single-crystal substrates. The MR ratio was found to be quite sensitive to the argon acceleration voltage (V/sub B/) in ion-beam sputtering and have a maximum around V/sub B/=600 V. In the preparation condition for obtaining maximum MR ratio, strong antiferromagnetic coupling (J) for the Co/sub x/Fe/sub 1-x/ layers via thin Cu layers and the oscillation behavior for this indirect exchange coupling with a 12-A period were observed. It was found that the MR ratio for Co/sub x/Fe/sub 1-x/ multilayers is larger than that for Co/Cu multilayers in the higher Co-concentration range in the Co/sub x/Fe/sub 1-x/ alloy. It was also found that in-plane uniaxial anisotropy (K/sub u/), on the order of 10 degrees erg/c/sup 3/, was induced when this system was prepared on MgO [110]. Giant MR can be induced for a small external field change for film with magnetocrystalline anisotropy. MR curve behavior can be explained by metamagnetic transition when K/sub u/, J, and Zeeman terms are considered.< |
Sponsorship | IEEE Magnetics Society |
Starting Page | 2751 |
Ending Page | 2753 |
Page Count | 3 |
File Size | 323442 |
File Format | |
ISSN | 00189464 |
Volume Number | 28 |
Issue Number | 5 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1992-09-01 |
Publisher Place | U.S.A. |
Access Restriction | One Nation One Subscription (ONOS) |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Giant magnetoresistance Iron Nonhomogeneous media Sputtering Anisotropic magnetoresistance Temperature Magnetic multilayers Substrates Argon Acceleration |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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