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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Kovac, Z. Novotny, V.J. |
| Copyright Year | 1965 |
| Abstract | A plasma-enhanced chemical vapor deposition process for silicon nitride films which can be used as overcoats for thin film magnetic recording disks has been developed. The most wear-resistant coatings are deposited at low concentrations of silane diluted with nitrogen, low deposition frequencies (100-400 kHz), low power densities (0.1 W/cm/sup 2/), low total pressure (30 Pa), and temperatures above 250 degrees C. Stoichiometric materials with hydrogen content down to 10 at.% are obtained. Increased deposition temperature leads to an increase in hardness and a decrease in hydrogen content in the films. The stress is compressive and increases linearly with increasing temperature. Wear rates drop by three orders of magnitude as the deposition temperature is raised from 100 to 250 degrees C. Unlubricated disks deposited above 250 degrees C exhibit low static friction without detectable wear for thousands and tens of thousands of start/stop cycles in dry and ambient environments, respectively. These disks lubricated with polyperfluoroethers have lifetimes in excess of ten thousand cycles even in dry conditions.< |
| Sponsorship | IEEE Magnetics Society |
| Starting Page | 5070 |
| Ending Page | 5072 |
| Page Count | 3 |
| File Size | 357193 |
| File Format | |
| ISSN | 00189464 |
| Volume Number | 27 |
| Issue Number | 6 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1991-11-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Silicon Magnetic films Semiconductor thin films Magnetic recording Plasma temperature Hydrogen Plasma chemistry Plasma density Chemical vapor deposition Semiconductor films |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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