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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Hoshi, Y. Naoe, M. |
| Copyright Year | 1965 |
| Abstract | The effect of the incident angle of sputtered particles relative to the substrate surface on the magnetic properties and c-axis orientation of Co-Cr films has been investigated using an opposed-targets sputtering apparatus that can operate at a gas pressure as low as 1*10/sup -4/ Torr. The c-axis orientation and magnetic properties of the film depend little on the incident angle below 45 degrees . However, oblique incidence at an angle above 50 degrees leads not only to a significant deterioration of the c-axis orientation but also to a marked decrease in the mean crystallite size, saturation magnetization, and perpendicular magnetic anisotropy energy. Films deposited at large incident angle have a porous structure and large c-axis canting angle. This is caused by the shadowing effect due to the surface roughness of the substrate. Substrate temperature and ion bombardment of the substrate during sputtering also affect the magnetic properties and c-axis orientation of the film but do not improve them significantly.< |
| Sponsorship | IEEE Magnetics Society |
| Starting Page | 3015 |
| Ending Page | 3017 |
| Page Count | 3 |
| File Size | 327398 |
| File Format | |
| ISSN | 00189464 |
| Volume Number | 24 |
| Issue Number | 6 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1988-11-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Magnetic properties Magnetic films Substrates Sputtering Crystallization Saturation magnetization Perpendicular magnetic anisotropy Shadow mapping Rough surfaces Surface roughness |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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