NDLI: Broadband Complementary Metal-Oxide Semiconductor Interconnection Transmission Line Measurements With Generalized Probe Transition Characterization and Verification of Multiline Thru-Reflect-Line Calibration

Content Provider	IEEE Xplore Digital Library
Author	Chien-Chang Huang
Copyright Year	2011
Abstract	This paper presents extraction techniques and measurement results for broadband complementary metal-oxide semiconductor (CMOS) interconnection transmission line (TL) measurements with generalized probe transition characterization and verification of multiline thru-reflect-line (TRL) calibration. Initially, the probe transition is represented by a transmission matrix instead of the conventional shunt/series model, with detailed parameter evaluation procedures using measured data from two lines that are twice in length. Subsequently, an additional long TL that fully exhibits the TL characteristics at low frequencies is characterized, whereas the matrix manipulations with the other two TL measured data are adapted for high-frequency regions to avoid the ill-conditioned problem. Consequently, broadband characterization for CMOS TL is achieved in a cost-effective manner. With an additional reflect test structure, the multiline TRL calibration can be performed as well for verification. The proposed method is examined by thin-film microstrip lines using CMOS 90-nm one-poly/nine-metal technology with measurement frequencies from 2 to 110 GHz.
Starting Page	1564
Ending Page	1569
Page Count	6
File Size	1667527
File Format	PDF
ISSN	21563950
Volume Number	3
Issue Number	9
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-09-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Probes Transmission line matrix methods Calibration CMOS integrated circuits Semiconductor device measurement Transmission line measurements Frequency measurement transmission lines interconnections scattering parameters measurement
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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