NDLI: Adhesion of Contaminant Particles to Advanced Photomask Materials

Content Provider	IEEE Xplore Digital Library
Author	Kilroy, C.M. Jaiswal, R.P. Beaudoin, S.P.
Copyright Year	1988
Abstract	A challenge to the use of extreme ultraviolet lithography (EUVL) is contamination of the mask during its processing and storage since current techniques for contamination prevention, such as pellicles, cannot be used with the mask materials under EUVL conditions. This paper characterizes the adhesion forces between model contaminant particles and photomask and thin film surfaces relevant to extreme ultraviolet and deep ultraviolet lithography. Specifically, experimental studies of the adhesion of nanoscale and microscale silica and silicon nitride particles to surfaces such as chromium oxynitride, quartz, MoSi, tantalum oxynitride, and ruthenium in air are described. In addition, an adhesion force mapping scheme, the “force band diagram,” is presented. This method allows upper and lower limits to be imposed on the adhesion force between given particle-substrate pairs. Two extremes of behavior are considered in the force bands, a rough prolate spheroid (minimum adhesion force) and a smooth oblate spheroid (maximum adhesion force). Experimental data are compared with the force band models and in all cases the measured adhesion forces fall within the established boundaries for particle sizes ranging from the nanoscale to the microscale. This technique is general, and can be applied to other surfaces of interest to the microelectronics manufacturing community.
Sponsorship	IEEE Electron Devices Society IEEE Components, Packaging, and Manufacturing Technology Society IEEE Reliability Society IEEE Solid-State Circuits Society
Starting Page	37
Ending Page	44
Page Count	8
File Size	373463
File Format	PDF
ISSN	08946507
Volume Number	25
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-02-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Force Surface roughness Rough surfaces Adhesives Substrates Surface topography Force measurement surface contamination Lithography particle measurements
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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