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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Denic, S.Z. Vasic, B. Charalambous, C.D. Jifeng Chen Wang, J.M. |
| Copyright Year | 1993 |
| Abstract | As the CMOS semiconductor technology enters nanometer regime, interconnect processes must be compatible with device roadmaps and meet manufacturing targets at the specified wafer size. The resulting ubiquitous process variations cause errors in data delivering through interconnects. This paper proposes an Information Theory based design method to accommodate process variations. Different from the traditional delay based design metric, the current approach uses achievable rate to relate interconnect designs directly to communication applications. More specifically, the data communication over a typical interconnect, a bus, subject to process variations (“uncertain” bus), is defined as a communication problem under uncertainty. A data rate, called the achievable rate, is computed for such a bus, which represents the lower bound on the maximal data rate attainable over the bus. When a data rate applied over the bus is smaller than the achievable data rate, a reliable communication can be guaranteed regardless of process variations, i.e., a bit error rate arbitrarily close to zero is achievable. A single communication strategy to combat the process variations is proposed whose code rate is equal to the computed achievable rate. The simulations show that the variations in the interconnect resistivity could have the most harmful effect regarding the achievable rate reduction. Also, the simulations illustrate the importance of taking into account bus parasitic parameters correlations when measuring the influence of the process variations on the achievable rates. |
| Sponsorship | IEEE Computer Society Association for Computing Machinery (ACM)/SIGDA IEEE Computer Society Technical Committee on Design Automation |
| Starting Page | 397 |
| Ending Page | 410 |
| Page Count | 14 |
| File Size | 845470 |
| File Format | |
| ISSN | 10638210 |
| Volume Number | 19 |
| Issue Number | 3 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-03-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Information analysis CMOS technology Computational modeling Semiconductor device modeling CMOS process Nanoscale devices Manufacturing processes Virtual manufacturing Semiconductor device manufacture Computer errors information theory Achievable rate bit error rate process variations global interconnect |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electrical and Electronic Engineering Software Hardware and Architecture |
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