Please wait, while we are loading the content...
Please wait, while we are loading the content...
| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Choong Hyun Lee Nishimura, T. Nagashio, K. Kita, K. Toriumi, A. |
| Copyright Year | 1963 |
| Abstract | We propose a two-step oxidation with high-pressure oxidation and low-temperature oxygen annealing to form ideal Ge/GeO2 stacks based on thermodynamic and kinetic control. The capacitance-voltage (C-V) characteristics of Ge/GeO2 MISCAPs with two-step oxidation revealed significant improvements of electrical properties, and the interface states density (Dit) estimated with a low-temperature conductance method that was below 1011 eV-1 cm-2 near the midgap. On the basis of our understanding of Ge oxidation, we demonstrated very high electron mobility in Ge n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) that exceeded the universal mobility in Si-MOSFETs. The peak electron mobility in Ge n-MOSFETs with the two-step oxidation was 1100 cm2/V · s in the Al/GeO2/Ge stack. This was achieved by taking care of the Ge/GeO2 channel interface. Since we clarified that mobility was still limited by the remaining extrinsic scattering sources, the present results promise much higher performance Ge complementary metal-oxide-semiconductor. |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 1295 |
| Ending Page | 1301 |
| Page Count | 7 |
| File Size | 1052784 |
| File Format | |
| ISSN | 00189383 |
| Volume Number | 58 |
| Issue Number | 5 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-05-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Oxidation MOSFET circuits Silicon Surface treatment Scattering Electron mobility Logic gates surface orientation effects Germanium high-pressure oxidation (HPO) metal–oxide–semiconductor field-effect transistors (MOSFETs) mobility |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
National Digital Library of India (NDLI) is a virtual repository of learning resources which is not just a repository with search/browse facilities but provides a host of services for the learner community. It is sponsored and mentored by Ministry of Education, Government of India, through its National Mission on Education through Information and Communication Technology (NMEICT). Filtered and federated searching is employed to facilitate focused searching so that learners can find the right resource with least effort and in minimum time. NDLI provides user group-specific services such as Examination Preparatory for School and College students and job aspirants. Services for Researchers and general learners are also provided. NDLI is designed to hold content of any language and provides interface support for 10 most widely used Indian languages. It is built to provide support for all academic levels including researchers and life-long learners, all disciplines, all popular forms of access devices and differently-abled learners. It is designed to enable people to learn and prepare from best practices from all over the world and to facilitate researchers to perform inter-linked exploration from multiple sources. It is developed, operated and maintained from Indian Institute of Technology Kharagpur.
Learn more about this project from here.
NDLI is a conglomeration of freely available or institutionally contributed or donated or publisher managed contents. Almost all these contents are hosted and accessed from respective sources. The responsibility for authenticity, relevance, completeness, accuracy, reliability and suitability of these contents rests with the respective organization and NDLI has no responsibility or liability for these. Every effort is made to keep the NDLI portal up and running smoothly unless there are some unavoidable technical issues.
Ministry of Education, through its National Mission on Education through Information and Communication Technology (NMEICT), has sponsored and funded the National Digital Library of India (NDLI) project.
| Sl. | Authority | Responsibilities | Communication Details |
|---|---|---|---|
| 1 | Ministry of Education (GoI), Department of Higher Education |
Sanctioning Authority | https://www.education.gov.in/ict-initiatives |
| 2 | Indian Institute of Technology Kharagpur | Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project | https://www.iitkgp.ac.in |
| 3 | National Digital Library of India Office, Indian Institute of Technology Kharagpur | The administrative and infrastructural headquarters of the project | Dr. B. Sutradhar bsutra@ndl.gov.in |
| 4 | Project PI / Joint PI | Principal Investigator and Joint Principal Investigators of the project |
Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon |
| 5 | Website/Portal (Helpdesk) | Queries regarding NDLI and its services | support@ndl.gov.in |
| 6 | Contents and Copyright Issues | Queries related to content curation and copyright issues | content@ndl.gov.in |
| 7 | National Digital Library of India Club (NDLI Club) | Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach | clubsupport@ndl.gov.in |
| 8 | Digital Preservation Centre (DPC) | Assistance with digitizing and archiving copyright-free printed books | dpc@ndl.gov.in |
| 9 | IDR Setup or Support | Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops | idr@ndl.gov.in |
|
Loading...
|