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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Sung Dae Suk Kyoung Hwan Yeo Keun Hwi Cho Ming Li Yun Young Yeoh Sung-Young Lee Sung Min Kim Eun Jung Yoon Min Sang Kim Chang Woo Oh Sung Hwan Kim Dong-Won Kim Donggun Park |
| Copyright Year | 2002 |
| Abstract | A gate-all-around (GAA) twin silicon nanowire MOSFET (TSNWFET) with 5-nm-radius channels on a bulk Si wafer is successfully fabricated to achieve extremely high-drive currents of 2.37 mA/ mum for n-channel and 1.30 mA/ mum for p-channel TSNWFETs with mid-gap TiN metal gate that are normalized by a nanowire diameter. It also shows good short-channel effects immunity down to 30-nm gate length due to the GAA structure and the nanowire channel. The effect of bottom parasitic transistor in TSNWFET is also investigated. |
| Sponsorship | IEEE Nanotechnology Council |
| Starting Page | 181 |
| Ending Page | 184 |
| Page Count | 4 |
| File Size | 660080 |
| File Format | |
| ISSN | 1536125X |
| Volume Number | 7 |
| Issue Number | 2 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2008-03-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFET circuits Transistors Silicon compounds Etching Shape Hydrogen Annealing Silicon germanium Germanium silicon alloys Tin 5 nm Bulk MOSFET gate all around (GAA) high performance MOSFET nanowire TSNWFET twin silicon nanowire 5nm Twin Silicon nanowire gate all around bulk MOSFET |
| Content Type | Text |
| Resource Type | Article |
| Subject | Nanoscience and Nanotechnology Electrical and Electronic Engineering Computer Science Applications |
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