NDLI: Microheated substrates for patterning cells and controlling development

Content Provider	IEEE Xplore Digital Library
Author	Wenmiao Shu Everett, W.N. Zhang, Q.X. Liu, M.H. Trigg, A. Yuexia Ma Spearing, S.M. Shu Wang Sue, H.-J. Moran, P.M.
Copyright Year	1992
Abstract	Here, we seek to control cellular development by devising a means through which cells can be subjected to a microheated environment in standard culture conditions. Numerous techniques have been devised for controlling cellular function and development via manipulation of surface environmental cues at the micro- and nanoscale. It is well understood that temperature plays a significant role in the rate of cellular activities, migratory behavior (thermotaxis), and in some cases, protein expression. Yet, the effects and possible utilization of micrometer-scale temperature fields in cell cultures have not been explored. Toward this end, two types of thermally isolated microheated substrates were designed and fabricated, one with standard backside etching beneath a dielectric film and another with a combination of surface and bulk micromachining and backside etching. The substrates were characterized with infrared microscopy, finite element modeling, scanning electron microscopy, stylus profilometry, and electrothermal calibrations. Neuron culture studies were conducted on these substrates to 1) examine the feasibility of using a microheated environment to achieve patterned cell growth and 2) selectively accelerate neural development on regions less than 100 /spl mu/m wide. Results show that attached neurons, grown on microheated regions set at 37/spl deg/C, extended processes substantially faster than those incubated at 25/spl deg/C on the same substrate. Further, unattached neurons were positioned precisely along the length of the heater filament (operating at 45/spl deg/C) using free convection currents. These preliminary findings indicate that microheated substrates may be used to direct cellular development spatially in a practical manner.
Sponsorship	IEEE Electron Devices Society American Society of Mechanical Engineering (ASME)
Starting Page	924
Ending Page	934
Page Count	11
File Size	3415130
File Format	PDF
ISSN	10577157
Volume Number	14
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Dielectric substrates Neurons Temperature Etching Scanning electron microscopy Standards development Proteins Dielectric films Micromachining Finite element methods thermal isolation BioMEMS cell patterning microfabrication microheater neural development neural outgrowth
Content Type	Text
Resource Type	Article
Subject	Mechanical Engineering Electrical and Electronic Engineering

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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